Piezoresistive sensors for atomic force microscopy

Authors

  • Tomasz Dębski Warsaw University of Technology image/svg+xml
  • Wolfgang Barth University of Kassel image/svg+xml
  • Ivo W. Rangelow University of Kassel image/svg+xml
  • Krzysztof Domański Warsaw University of Technology image/svg+xml
  • Daniel Tomaszewski Insitute of Electron Technology, Poland
  • Piotr Grabiec Insitute of Electron Technology, Poland
  • Andrzej Jakubowski Warsaw University of Technology image/svg+xml

DOI:

https://doi.org/10.26636/jtit.2001.1.45

Keywords:

atomic force microscopy, piezoresistive sensors, technology simulation, technology characterization

Abstract

An important element in microelectronics is the comparison of the modelling and measurements results of the real semiconductor devices. Our paper describes the final results of numerical simulation of a micromechanical process sequence of the atomic force microscopy (AFM) sensors. They were obtained using the virtual wafer fab (VWF) software, which is used in the Institute of Electron Technology (IET). The technology mentioned above is used for fabrication of the AFM cantilevers, which has been designed for measurement and characterization of the surface roughness, the texturing, the grain size and the hardness. The simulation are very useful in manufacturing other microcantilever sensors.

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References

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Submitted

2023-04-06

Published

2001-03-30

Issue

No. 1 (2001)

Section

ARTICLES FROM THIS ISSUE

License

Copyright (c) 2001 Journal of Telecommunications and Information Technology

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

How to Cite

[1]
T. Dębski, “Piezoresistive sensors for atomic force microscopy”, JTIT, vol. 3, no. 1, pp. 35–39, Mar. 2001, doi: 10.26636/jtit.2001.1.45.

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