Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology

Authors

  • Tomasz Bieniek
  • Romuald B. Beck
  • Andrzej Jakubowski
  • Grzegorz Głuszko
  • Piotr Konarski
  • Michał Ćwil

DOI:

https://doi.org/10.26636/jtit.2007.3.819

Keywords:

CMOS, dual gate oxide, gate stack, oxynitride, plasma implantation

Abstract

The goal of this work was to study nitrogen implantation from plasma with the aim of applying it in dual gate oxide technology and to examine the influence of the rf power of plasma and that of oxidation type. The obtained structures were examined by means of ellipsometry, SIMS and electrical characterization methods.

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Published

2007-09-30

Issue

No. 3 (2007)

Section

ARTICLES FROM THIS ISSUE

License

Copyright (c) 2023 Journal of Telecommunications and Information Technology

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

How to Cite

[1]
T. Bieniek, R. B. Beck, A. Jakubowski, G. Głuszko, P. Konarski, and M. Ćwil, “Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology”, JTIT, vol. 29, no. 3, pp. 3–8, Sep. 2007, doi: 10.26636/jtit.2007.3.819.

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