Recent developments in vertical MOSFETs and SiGe HBTs

Authors

  • Stephen Hall
  • Peter Ashburn
  • Octavian Buiu
  • Kees de Groot

DOI:

https://doi.org/10.26636/jtit.2004.1.232

Keywords:

vertical MOSFET, HBT, SOI

Abstract

There is a well recognised need to introduce new materials and device architectures to Si technology to achieve the objectives set by the international roadmap. This paper summarises our work in two areas: vertical MOSFETs, which can allow increased current drive per unit area of Si chip and SiGe HBT`s in silicon-on-insulator technology, which bring together and promise to extend the very high frequency performance of SiGe HBT`s with SOI-CMOS.

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Published

2004-03-30

Issue

Section

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How to Cite

[1]
S. Hall, P. Ashburn, O. Buiu, and K. de Groot, “Recent developments in vertical MOSFETs and SiGe HBTs”, JTIT, vol. 15, no. 1, pp. 26–35, Mar. 2004, doi: 10.26636/jtit.2004.1.232.

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