ÖSTLING, Mikael; GUNNAR MALM, Bengt; VON HAARTMAN, Martin; H ̊allstedt Julius; ZHANG, Zhen; HELLSTRÖM, Per-Erik; ZHANG, Shili. Challenges for 10 nm MOSFET process integration. Journal of Telecommunications and Information Technology, [S. l.], v. 28, n. 2, p. 25–32, 2007. DOI: 10.26636/jtit.2007.2.805. Disponível em: https://jtit.pl/jtit/article/view/805. Acesso em: 16 apr. 2026.