Investigations of electron emission from DLC thin films deposited by means of RF PCVD at various self-bias voltages

Authors

  • Dagmara Jarzyńska
  • Zbigniew Znamirowski
  • Marian Cłapa
  • Elżbieta Staryga

DOI:

https://doi.org/10.26636/jtit.2007.3.827

Keywords:

DLC, RF PCVD, Raman spectroscopy, turn-on field, electron emission, effective work function

Abstract

The aim of this paper is to report the results of field emission experiments on undoped, flat diamond-like carbon (DLC) thin films deposited at various self-bias voltages using radio frequency plasma chemical vapor deposition (RF PCVD) technique. It has been observed that the emission properties improve when the absolute value of self-bias voltage becomes higher, e.g., the turn-on field value decreases. The correlation between electron field emission and sp2 content in these films showed improvement of electron emission properties of DLC films for higher amount of sp2 phase.

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Published

2007-09-30

Issue

No. 3 (2007)

Section

ARTICLES FROM THIS ISSUE

License

Copyright (c) 2023 Journal of Telecommunications and Information Technology

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

How to Cite

[1]
D. Jarzyńska, Z. Znamirowski, M. Cłapa, and E. Staryga, “Investigations of electron emission from DLC thin films deposited by means of RF PCVD at various self-bias voltages”, JTIT, vol. 29, no. 3, pp. 39–43, Sep. 2007, doi: 10.26636/jtit.2007.3.827.