Mroczyński, Robert, Tomasz Bieniek, Romuald B. Beck, Michał Ćwil, Piotr Konarski, Patrick Hoffmann, and Dieter Schmeißer. “Comparison of Composition of Ultra-Thin Silicon Oxynitride layers’ Fabricated by PECVD and Ultrashallow Rf Plasma Ion Implantation”. Journal of Telecommunications and Information Technology 29, no. 3 (September 30, 2007): 20–24. Accessed April 18, 2026. https://jtit.pl/jtit/article/view/822.