T. Bieniek, R. B. Beck, A. Jakubowski, G. Głuszko, P. Konarski, and M. Ćwil, “Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology”, JTIT, vol. 29, no. 3, pp. 3–8, Sep. 2007, doi: 10.26636/jtit.2007.3.819.