T. Bieniek, R. B. Beck, A. Jakubowski, and A. Kudła, “Ultra-shallow nitrogen plasma implantation for ultra-thin silicon oxynitride (SiOxNy) layer formation”, JTIT, vol. 19, no. 1, pp. 70–75, Mar. 2005, doi: 10.26636/jtit.2005.1.290.