ENGSTRÖM, Olof; RAEISSI, Bahman; PISCATOR, Johan; MITROVIC, Ivona Z.; HALL, Stephen; GOTTLOB, Heinrich D. B.; SZMIDT, Mathias; HURLEY, Paul K.; CHERKAOUI, Karim. Charging Phenomena at the Interface Between High-k Dielectrics and SiOx Interlayers. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 42, n. 4, p. 81–90, 2010. DOI: 10.26636/jtit.2010.4.1115. Disponível em: https://jtit.pl/jtit/article/view/1115. Acesso em: 17 jun. 2026.