ENGSTRÖM, Olof; RAEISSI, Bahman; PISCATOR, Johan; MITROVIC, Ivona Z; HALL, Stephen; GOTTLOB, Heinrich D. B.; SCHMIDT, Mathias; HURLEY, Paul K.; CHERKAOUI, Karim. Charging Phenomena at the Interface Between High-k Dielectrics and SiOx Interlayers. Journal of Telecommunications and Information Technology, [S. l.], v. 39, n. 1, p. 10–19, 2010. DOI: 10.26636/jtit.2010.1.1023. Disponível em: https://jtit.pl/jtit/article/view/1023. Acesso em: 12 dec. 2024.