BIENIEK, Tomasz; B. BECK, Romuald; JAKUBOWSKI, Andrzej; GŁUSZKO, Grzegorz; KONARSKI, Piotr; ĆWIL, Michał. Applying shallow nitrogen implantation from RF plasma for dual gate oxide technology. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 29, n. 3, p. 3–8, 2007. DOI: 10.26636/jtit.2007.3.819. Disponível em: https://jtit.pl/jtit/article/view/819. Acesso em: 9 oct. 2026.