SZMIDT, Jan; WERBOWY , Aleksander; DUSIŃSKI, Emil; ZDUNEK, Krzysztof. Reliability of MIS transistors with plasma deposited Al2O3 gate dielectric film. Journal of Telecommunications and Information Technology, [S. l.], v. 3, n. 1, p. 70–75, 2001. DOI: 10.26636/jtit.2001.1.37. Disponível em: https://jtit.pl/jtit/article/view/37. Acesso em: 12 dec. 2024.