BIENIEK, Tomasz; BECK, Romuald B.; JAKUBOWSKI, Andrzej; KUDŁA, Andrzej. Ultra-shallow nitrogen plasma implantation for ultra-thin silicon oxynitride (SiOxNy) layer formation. Journal of Telecommunications and Information Technology, [S. l.], v. 19, n. 1, p. 70–75, 2005. DOI: 10.26636/jtit.2005.1.290. Disponível em: https://jtit.pl/jtit/article/view/290. Acesso em: 12 dec. 2024.