NAZAROV, Alexei N.; HOUK, Yuri; KILCHYTSKA, Valeriya I. High-field current transport and charge trapping in buried oxide of SOI materials under high-field electron injection. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 15, n. 1, p. 50–61, 2004. DOI: 10.26636/jtit.2004.1.229. Disponível em: https://jtit.pl/jtit/article/view/229. Acesso em: 19 jun. 2026.