Östling, M., Gunnar Malm, B., von Haartman, M., H ̊allstedt J., Zhang, Z., Hellström, P.-E., & Zhang, S. (2007). Challenges for 10 nm MOSFET process integration. Journal of Telecommunications and Information Technology, 28(2), 25-32. https://doi.org/10.26636/jtit.2007.2.805