Kalisz, M.; Głuszko, G.; Beck, R. B. Novel Method of Improving Electrical Properties of Thin PECVD Oxide Films by Fluorination of Silicon Surface Region by RIE in RF CF4 Plasma. JTIT 2010, 39 (1), 20-24. https://doi.org/10.26636/jtit.2010.1.1058.