Kalisz, M. et al. 2010. Novel Method of Improving Electrical Properties of Thin PECVD Oxide Films by Fluorination of Silicon Surface Region by RIE in RF CF4 Plasma. Journal of Telecommunications and Information Technology. 39, 1 (Mar. 2010), 20–24. DOI:https://doi.org/10.26636/jtit.2010.1.1058.