Mroczyński, R. et al. 2007. Comparison of composition of ultra-thin silicon oxynitride layers’ fabricated by PECVD and ultrashallow rf plasma ion implantation. Journal of Telecommunications and Information Technology. 29, 3 (Sep. 2007), 20–24. DOI:https://doi.org/10.26636/jtit.2007.3.822.